Advances in extreme-UV lithography
The SEMATECH Berkeley microfield exposure tool facilitates progress in the areas of extreme-UV photoresist and mask fabrication.
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admin April 29th, 2009 Micro - Nano Fabrication
Advances in extreme-UV lithography
Extreme UV lithography may be used with double patterning
Maskless multibeam laser irradiation enables large-area nanostructure fabrication
Maskless multibeam laser irradiation enables large-area nanostructure fabrication
Challenges and solutions for extreme ultraviolet lithography at 22nm
Algorithm variability in optical lithography
Maskless lithography: photons rather than electrons
Progress in projection maskless lithography
Generation of extreme ultraviolet radiation with a BesselGaussian beam
Effects of laser pulse duration on extreme ultraviolet spectra from double optical gating
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