Bubble and antibubble defects in 193i lithography
Air bubbles and topcoat particles act as microlenses, distorting patterns projected on the resist. Fourth in a series.
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admin January 22nd, 2008 Micro - Nano Fabrication
Non-lensing defects and defect reduction for 193i
Extendability of 193nm immersion lithography
Maskless lithography: photons rather than electrons
Progress in projection maskless lithography
Mapping local defects of extended media using localized structures
Two-photon excited luminescence spectral distribution observation in wide-gap semiconductor crystals
Laser-induced destruction of gold nanoshells: new weapons in the cell-killing arsenal
Ultrashort-pulse laser calligraphy
Designing nanostructures with optimized surface-enhanced Raman scattering behavior
Using nanomachining to repair photomasks for the 32nm node and beyond
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