Fabrication of three-dimensional photonic crystal structures by interferometric lithography and nanoparticle self-assembly
Deying Xia, Jingyu Zhang, Xiang He, and S. R. J. Brueck
We report a simple approach to fabrication of three-dimensional photonic crystal structures. One-dimensional photoresist patterns (lines) are defined as templates using interferometric lithography and silica nanoparticles are self-assembled around the photoresist patterns using spin coating. Multipl ... [Appl. Phys. Lett. 93, 071105 (2008)] published Wed Aug 20, 2008.
Read full Article »
We report a simple approach to fabrication of three-dimensional photonic crystal structures. One-dimensional photoresist patterns (lines) are defined as templates using interferometric lithography and silica nanoparticles are self-assembled around the photoresist patterns using spin coating. Multipl ... [Appl. Phys. Lett. 93, 071105 (2008)] published Wed Aug 20, 2008.
Read full Article »
Leave a Reply